AJA Sputtering Cathode With Target . Not Sure Of The Material DZ-6-004

Anode layer ion source plasma sputtering thin film deposition

Silicon Carbide ( N-Type ) Sputtering Target, 3" D x 0.25" thick,

NEW SEM Gold Au Sputtering Target: 99.99% Pure, 57mm D x 0.1mm Thick

Silicon Nitride Si3N4 sputtering target 99.5% 3" diameter x 0.125" thick

Fe/Ga 75/25 at% 99.98% Iron/Gallium Sputtering Target 3"Ø x 0.75"Thick

Silicon Nitride, Si3N4 sputtering target, 3" D x 0.125" thick, 99.9% pure

ULVAC PST-030AU Sputter ION PUMP, 420784