Huttinger TIG 10/100 Sputtering Plasma Control Panel

Anode layer ion source plasma sputtering thin film deposition

HUTTINGER PFG300 RF GENERATOR 300 WATT 13.56 MHz, Powers Up, AS IS

New! Niobium Sputtering Target Nb 99.95% 2" Diameter x 0.125" Thick EJTNBXX352A2

Silicon Nitride, Si3N4 sputtering target, 3" D x 0.125" thick, 99.9% pure

Huttinger TIG 60 DC Plasma Sputtering Controller

Anode layer ion source plasma sputtering thin film 2.75" conflat SHV baseplate

(Lot of 12 Jars) Sputtering Anode Shields