Anode layer ion source plasma sputtering thin film deposition

SEM Electron Gun Scanning Electron Microscope High Voltage Ion Source X-Ray kv

Anode layer ion source plasma sputtering thin film 2.75" conflat SHV baseplate

Advanced Energy Pinnacle 12kW Magnetron DC Power Supply AE 3152392-000 480VAC

Carbon Sputtering Target, graphitic

Ti-tungsten sputtering target, W/Ti 90/10 wt%, 99.99% pure, 2" dia x1/4" thick

Ti-tungsten sputtering target, W/Ti 90/10 wt%, 99.99% 3" diameter x 0.25" thick

Panel For Thin Film Deposition Equipment